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Semiconductor manufacturing handbook [electronic resource] /

por Geng, Hwaiyu; Zhou, Lin; Park, Ilsun; Ravi, K. V; Rathore, Hazara S; Chanda, Kaushik; Ren, L. P; Tu, King N; Coumou, David J; Biltoft, Peter; Howard, Charles; Mack, Chris A; Graf, Michael; Zhang, Peng; Lai, Shouliang; Solzbacher, Florian; McInerney, Edward J; Ramdani, Jamal; Vaccari, Giovanni; Ritzdorf, Tom; Klocke, John; Dyer, Timothy S; Machamer, Andrew; Blair, Donald W; Arai, Kazuhisa; Kobayashi, Yoshikazu; Otani, Hideaki; Tonnies, Dietrich; Topper, Michael; Wang, Zhong L; Huff, Michael A; Liu, David N; Curcie, Wayne D; Sweeney, Joseph D; Cox, James C; Cavicchi, Kristin; Barsness, Dan; Gould, Charles K; Albrecht, David J; Li, Bo; Carriker, Wayne; Haris, Clint; Peltinov, Ram; Menaker, Mina; Scibilia, Bruno; Altis, Yoan Dupret; McCafferty, Robert H; Davis, Brett J; Trammell, Steven R; Pavlotsky, Richard V; Beck, Stephen C; Gendreau, Michael; Amick, Hal; Levit, Larry; Muller, Chris; Kochevar, Steven; Gromala, Jerry; Pinkowski, Richard E; IDC Corporation.
Tipo de material: materialTypeLabelLibroNúmero de ubicación: 621.3815/2Series: McGraw-Hill's AccessEngineering: Editor: New York : McGraw-Hill, [2005]Descripción: 1 electronic text : ill.ISBN: 0071468153; 9780071445597.Materia(s): Semiconductors -- Design and construction | Integrated circuits -- Design and construction | Semiconductors -- Materials | Integrated circuits -- Reliability | Dielectrics | Silicides | Plasma engineering | Process control | Vacuum techology | Integrated circuits -- Masks | Microlithography | Ion implantation | Rapid thermal process | Plasma etching | Etching | Physical vapor deposition | Chemical vapor deposition | Epitaxy | Electrolytic polishing | Semiconductors -- Polishing | Semiconductors -- Cleaning | Grinding and polishing | Microelectronic packaging | Electronic packaging | Nanotechnology | Microfabrication | Microelectromechanical systems | Flat panel displays | Gases | Waste gases -- Purification | Hydraulic conveying | Slurry pipelines | Chemical plants -- Waste disposal | Water-supply engineering | Materials handling | Metrology | Six sigma (Quality control standard) | Semiconductor industry -- Environmental aspects | Semiconductor industry -- Health aspects | Semiconductor industry -- Safety measures | Clean rooms -- Design and construction | Vibration | Noise control | Static eliminators | Electrostatics | Airborne infection | Air -- Pollution | Sewage -- Purification -- Neutralization | Electronic books | Internet resourcesRecursos en línea: Subscription required Also issued in print and PDF version.
Contenidos:
http://www.loc.gov/catdir/enhancements/fy0624/2005045580-t.html
Pt. 1. Semiconductor fundamentals and basic materials -- pt. 2. Wafer processing -- pt. 3. Final manufacturing -- pt. 4. Nanotechnology, EMS, and FPD -- pt. 5. Gases and chemicals -- pt. 6. Fab yield, operations, and facilities.
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Tipo de ítem Ubicación actual Colección Signatura topográfica Estado Fecha de vencimiento
Recurso Electrónico Recurso Electrónico Biblioteca Fundación Área Andina - Medellín
Colección digital Disponible
Recurso Electrónico Recurso Electrónico Biblioteca Fundación Área Andina - Pereira
Colección digital Disponible
Recurso Electrónico Recurso Electrónico Biblioteca Fundación Área Andina - Valledupar
Colección digital Disponible
Recurso Electrónico Recurso Electrónico Biblioteca General Fundación Área Andina - Bogotá
Colección digital Disponible

Print version c2005.

Includes bibliographical references and index.

http://www.loc.gov/catdir/enhancements/fy0624/2005045580-t.html

Pt. 1. Semiconductor fundamentals and basic materials -- pt. 2. Wafer processing -- pt. 3. Final manufacturing -- pt. 4. Nanotechnology, EMS, and FPD -- pt. 5. Gases and chemicals -- pt. 6. Fab yield, operations, and facilities.

Also issued in print and PDF version.

Contributor biographical information: http://www.loc.gov/catdir/enhancements/fy0624/2005045580-b.html

Description based on cover image and table of contents, viewed on May 4, 2007.


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